[IEEE] Characterization of Al and Ni-P Films as Hardmasks for the ICP-RIE Plasma Etching Bosch Process |
|
This post will be closed automatically in 2026-01-21 19:32
Best Answer
2026-1-18
|
| |
30
A Comparative Study of Linguistic Style between AI Chatbot and Human in Chinese Civil Servant Interview
50
[Full book]Special Design Topics in Digital Wideband Receivers
50
[Full book]In-Band Full-Duplex Wireless Systems Handbook
30
2025 4th International Conference on Advances in Computing, Communication, Embedded and Secure Systems (ACCESS)
30
Pedestrian 3D Shape Understanding for Person Re-Identification via Multi-View Learning
