PIC/MCC simulations of the effects of a radio-frequency bias on inductively coupled plasmas

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journal：Plasma Sources Science and Technology

Authors：Xiandi Li; Zhaoyu Chen; Zili Chen; Yu Wang; Minglun Tian; Hongyu Wang; Zhipeng Chen; Wei Jiang; Julian Schulze; Ya Zhang

Published date：2025-9-1

DOI：10.1088/1361-6595/ae0763

PDF link：https://iopscience.iop.org/article/10.1088/1361-6595/ae0763

Article link：https://doi.org/10.1088/1361-6595/ae0763

Article Source：IOP Publishing。

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