[SPIE] High-resolution multicolumn electron beam inspection for EUV reticle development and production

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bosslyg Post time 4 day(s) ago | Show all posts |Read mode

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journal：Metrology, Inspection, and Process Control XL

Authors：Shin-An Ku; Yu-Liang Hong; Chia-Hao Chang; Chia-Fong Chang; Shin-Chang Lee; Chin-Kun Wang; Mark Chien; Wei-Chieh Wang; Jason Huang; Jeff Chen; Mike Yeh; Jinggang Zhu; Jinhua Chen; Art Martinez; David Aupperle; Michael BenYishay; Manny Wu; Amo Chen; Mingwei Li

Published date：2026-4-9

DOI：10.1117/12.3111792

Article link：https://doi.org/10.1117/12.3111792

Article Source：SPIE。

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