Enhanced Photocatalytic Performance of UiO-66-NH2 MOFs by Ar Plasma Modification for Reduction of Cr (VI)

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journal：Industrial & Engineering Chemistry Research

Authors：Douhao Yang; Ruiting Jian; Jianjun Yan; Ao Zhang; Bowen Liu; Zhongwei Liu

Published date：2024-3-27

DOI：10.1021/acs.iecr.4c00308

PDF link：https://pubs.acs.org/doi/pdf/10.1021/acs.iecr.4c00308

Article link：https://doi.org/10.1021/acs.iecr.4c00308

Article Source：American Chemical Society (ACS)。

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[ACS] Enhanced Photocatalytic Performance of UiO-66-NH2 MOFs by Ar Plasma Modification for Reduction of Cr (VI)

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