[ACS] Atomic Layer Deposition of ZrO2 Films at High Temperatures (>350 ∼C) Using a Modified Cyclopentadienyl Zr Precursor

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journalㄩACS Applied Materials & Interfaces

AuthorsㄩJae Chan Park; Chang Ik Choi; Hongseok Jang; Suhyong Yun; Miso Kim; Ji-Hoon Ahn; Woo-Hee Kim; Bonggeun Shong; Tae Joo Park

Published dateㄩ2025-9-17

DOIㄩ10.1021/acsami.5c11791

PDF linkㄩhttps://pubs.acs.org/doi/pdf/10.1021/acsami.5c11791

Article linkㄩhttps://doi.org/10.1021/acsami.5c11791

Article SourceㄩAmerican Chemical Society (ACS)


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Amoghms Post time 2026-6-4 10:36:42 | Show all posts

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