[Elsevier] Argon-induced thermal field optimization and oxygen volatilization for vacancy-oxygen defect control in CZ silicon growth

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journalㄩApplied Thermal Engineering

AuthorsㄩQitao Zhang; Ai Wang; Junxian Chai; Tai Li; Peilin He; Xiang Zhou; Guoqiang Lv; Xingwei Yang; Wenhui Ma

Published dateㄩ2025-12-

DOIㄩ10.1016/j.applthermaleng.2025.128610

PDF linkㄩhttps://www.sciencedirect.com/sc ... 359431125032028/pdf

Article linkㄩhttps://doi.org/10.1016/j.applthermaleng.2025.128610

Article SourceㄩElsevier BV


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