[OSA] Dual-channel additive compensation of mask-plane illumination uniformity for i-line lithography

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journal：Applied Optics

Authors：Runqi Zhou; Lixin Zhao; Yu He

Published date：2026-5-20

DOI：10.1364/ao.596489

PDF link：https://opg.optica.org/viewmedia.cfm?URI=ao-65-15-4958&seq=0

Article link：https://doi.org/10.1364/ao.596489

Article Source：Optica Publishing Group。

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[OSA] Dual-channel additive compensation of mask-plane illumination uniformity for i-line lithography Copy