[Other] Quantitative analysis of plasma-enhanced chemical vapor deposition mechanisms: Quantum chemical and plasma-fluid dynamics investigation on tetraethoxysilane/O2 plasma

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journalㄩJournal of Vacuum Science & Technology A

AuthorsㄩHu Li; Kazuki Denpoh

Published dateㄩ2024-7-1

DOIㄩ10.1116/6.0003523

PDF linkㄩhttps://pubs.aip.org/avs/jva/art ... 002_1_6.0003523.pdf

Article linkㄩhttps://doi.org/10.1116/6.0003523

Article SourceㄩAmerican Vacuum Society


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