[Other] Understanding plasma enhanced chemical vapor deposition mechanisms in tetraethoxysilane-based plasma

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journalㄩJournal of Vacuum Science & Technology B

AuthorsㄩHu Li; Koichi Ishii; Shun Sasaki; Mao Kamiyama; Akinori Oda; Kazuki Denpoh

Published dateㄩ2023-3-1

DOIㄩ10.1116/6.0002409

PDF linkㄩhttps://pubs.aip.org/avs/jvb/art ... 022208_1_online.pdf

Article linkㄩhttps://doi.org/10.1116/6.0002409

Article SourceㄩAmerican Vacuum Society


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