[Other] Review and perspective on ferroelectric HfO2-based thin films for memory applications

sulimaan Post time Yesterday 15:13 | Show all posts |Read mode
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journalㄩMRS Communications

AuthorsㄩMin Hyuk Park; Young Hwan Lee; Thomas Mikolajick; Uwe Schroeder; Cheol Seong Hwang

Published dateㄩ2018-9-

DOIㄩ10.1557/mrc.2018.175

PDF linkㄩhttp://link.springer.com/content/pdf/10.1557/mrc.2018.175.pdf

Article linkㄩhttps://doi.org/10.1557/mrc.2018.175

Article SourceㄩSpringer Science and Business Media LLC


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jakir_ete_ruet Post time Yesterday 15:15 | Show all posts

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