Air-Stable Low Dielectric Constant SiOx/AlOx Nanolaminate Films Deposited by Thermal Pulsed Chemical Vapor Deposition with Continuous Carbon Doping For Interlayer Dielectric

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journal：ACS Applied Nano Materials

Authors：Jing Mu; Xinyu Wang; James Huang; Charles H. Winter; Kesong Wang; Dipayan Pal; Ping-che Lee; Diego Contreras Mora; Jit Dutta; Ajay Yadav; Keith Wong; Srinivas Nemani; Ellie Yieh; Andrew C. Kummel

Published date：2025-8-29

DOI：10.1021/acsanm.5c03189

PDF link：https://pubs.acs.org/doi/pdf/10.1021/acsanm.5c03189

Article link：https://doi.org/10.1021/acsanm.5c03189

Article Source：American Chemical Society (ACS)。

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[ACS] Air-Stable Low Dielectric Constant SiOx/AlOx Nanolaminate Films Deposited by Thermal Pulsed Chemical Vapor Deposition with Continuous Carbon Doping For Interlayer Dielectric

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