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[ACS] Halogen and Halomethyl Substitution Effects in Anthracene-Based Extreme Ultraviolet Resist Models: A Theoretical Study of Dissociation Mechanisms and Optoelectronic Properties

Sweetums33 Post time The day before yesterday 23:57 | Show all posts |Read mode
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journalㄩThe Journal of Physical Chemistry A

AuthorsㄩVishal Gupta; Rohit Anand; In Kee Park; Florian Brette; Geunsik Lee

Published dateㄩ2026-5-21

DOIㄩ10.1021/acs.jpca.5c08102

PDF linkㄩhttps://pubs.acs.org/doi/pdf/10.1021/acs.jpca.5c08102

Article linkㄩhttps://doi.org/10.1021/acs.jpca.5c08102

Article SourceㄩAmerican Chemical Society (ACS)﹝


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