Synthesis and Characterizations of a Nonalkyl Tin Oxo Cluster and its Application as High EUV Absorption Coefficient and Etch Resistant Inorganic Resist for EUV Lithography

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journal：Inorganic Chemistry

Authors：Hyeok Yun; Soyeong Heo; Jiyoung Bang; Minyeob Kim; Hyung-Bae Moon; Siwoo Noh; Geonhwa Kim; Hee-Seon Lee; Kyuyoung Heo; Sangsul Lee; Ki-Jeong Kim; Cheol-Min Kim; Hyun-Dam Jeong

Published date：2025-3-17

DOI：10.1021/acs.inorgchem.5c00495

PDF link：https://pubs.acs.org/doi/pdf/10.1021/acs.inorgchem.5c00495

Article link：https://doi.org/10.1021/acs.inorgchem.5c00495

Article Source：American Chemical Society (ACS)。

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[ACS] Synthesis and Characterizations of a Nonalkyl Tin Oxo Cluster and its Application as High EUV Absorption Coefficient and Etch Resistant Inorganic Resist for EUV Lithography

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[ACS] Synthesis and Characterizations of a Nonalkyl Tin Oxo Cluster and its Application as High EUV Absorption Coefficient and Etch Resistant Inorganic Resist for EUV Lithography Copy

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[ACS] Synthesis and Characterizations of a Nonalkyl Tin Oxo Cluster and its Application as High EUV Absorption Coefficient and Etch Resistant Inorganic Resist for EUV Lithography