[Elsevier] Trends in photoresist materials for extreme ultraviolet lithography: A review

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journalㄩMaterials Today

AuthorsㄩXiaolin Wang; Peipei Tao; Qianqian Wang; Rongbo Zhao; Tianqi Liu; Yang Hu; Ziyu Hu; Yimeng Wang; Jianlong Wang; Yaping Tang; Hong Xu; Xiangming He

Published dateㄩ2023-7-

DOIㄩ10.1016/j.mattod.2023.05.027

PDF linkㄩhttps://www.sciencedirect.com/sc ... 369702123001785/pdf

Article linkㄩhttps://doi.org/10.1016/j.mattod.2023.05.027

Article SourceㄩElsevier BV


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