[IOP] Toward atomic layer etching in continuous flow, pulsed bias power plasmas

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journal：Plasma Sources Science and Technology

Authors：Jeremy J Mettler; Qinzhen Hao; Mahmoud Elgarhy; Heejung Kim; Sang Ki Nam; Song-Yun Kang; Vincent M Donnelly

Published date：2026-7-1

DOI：10.1088/1361-6595/ae8884

PDF link：https://iopscience.iop.org/article/10.1088/1361-6595/ae8884

Article link：https://doi.org/10.1088/1361-6595/ae8884

Article Source：IOP Publishing。

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[IOP] Toward atomic layer etching in continuous flow, pulsed bias power plasmas