[SPIE] Self-aligned fin cut last patterning scheme for fin arrays of 24nm pitch and beyond

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journalㄩAdvances in Patterning Materials and Processes XXXVI

AuthorsㄩSylvain Baudot; Assawer Soussou; Alexey P. Milenin; Toby Hopf; Shouhua Wang; Pieter Wecks; Benjamin Vincent; Joseph Ervin; Steven Demuynck

Published dateㄩ2019-3-25

DOIㄩ10.1117/12.2514927

Article linkㄩhttps://doi.org/10.1117/12.2514927

Article SourceㄩSPIE


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