[Other] Contamination Behavior of Bare Silicon Wafer Surface During Single-Wafer Process Using Deionized Water Containing Ultra-Trace Metal Impurities

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journalㄩECS Journal of Solid State Science and Technology

AuthorsㄩK. Tsutano; T. Mawaki; Y. Shirai; R. Kuroda

Published dateㄩ2025-5-1

DOIㄩ10.1149/2162-8777/add809

PDF linkㄩhttps://iopscience.iop.org/article/10.1149/2162-8777/add809

Article linkㄩhttps://doi.org/10.1149/2162-8777/add809

Article SourceㄩThe Electrochemical Society


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