[Elsevier] Area selective deposition of tungsten and ruthenium using a tungsten precursor inhibitor

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journal:Applied Surface Science

Authors:Bonwook Gu; Chi Thang Nguyen; Mingyu Lee; Sunghwan Jo; Ngoc Le Trinh; Youngho Kang; Seung Wook Ryu; Han-Bo-Ram Lee

Published date:2026-2-

DOI:10.1016/j.apsusc.2025.165129

PDF link:https://www.sciencedirect.com/sc ... 169433225028466/pdf

Article link:https://doi.org/10.1016/j.apsusc.2025.165129

Article Source:Elsevier BV


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