[SPIE] Methods to improve the PCM yield of 12μm vanadium oxide uncooled infrared detector mass production process on 200mm wafers

pup1112 Post time 6 day(s) ago | Show all posts |Read mode
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期刊:第十届新型光电检测技术及应用研讨会

作者:宁宁;周宏喜;张启宇;龚锡怀;蔡胜东;司静;彭攀;彭璐璐;潘博进;姜亚东

发表日期:2025年2月17日

DOI:10.1117/12.3056772

文章链接:https://doi.org/10.1117/12.3056772

文章来源:SPIE


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