[IEEE] Low-Capacitance, High-CDM ESD Protection Design with FEOL and BEOL Co-Optimization in 4nm Bulk FinFET Technology

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journal:2022 44th Annual EOS/ESD Symposium (EOS/ESD)

Authors:Yi-Feng Chang; Han-Jen Yang; Tzu-Heng Chang; Jam-Wem Lee; Kuo-Ji Chen

Published date:2022-9-18

DOI:10.23919/eos/esd54763.2022.9928456

PDF link:https://ieeexplore.ieee.org/stampPDF/getPDF.jsp?arnumber=9928456

Article link:https://doi.org/10.23919/eos/esd54763.2022.9928456



Article Source:IEEE。



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