[Elsevier] Atomic layer deposited TiN capping layer for sub-10nm ferroelectric Hf0.5Zr0.5O2 with large remnant polarization and low thermal budget

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journal:Applied Surface Science

Authors:Chin-I Wang; Chun-Yuan Wang; Teng-Jan Chang; Yu-Sen Jiang; Jing-Jong Shyue; Hsin-Chih Lin; Miin-Jang Chen

Published date:2021-12-

DOI:10.1016/j.apsusc.2021.151152

PDF link:https://www.sciencedirect.com/sc ... 16943322102208X/pdf

Article link:https://doi.org/10.1016/j.apsusc.2021.151152



Article Source:Elsevier BV。



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