[SPIE] Pushing deep greyscale lithography beyond 100-m pattern depth with a novel photoresist

daxue Post time Yesterday 15:22 | Show all posts |Read mode
This post will be closed automatically in 2026-09-17 15:21
Reward10points

journal:Novel Patterning Technologies 2023

Authors:Christine Schuster; Gerda Ekindorf; Anja Voigt; Arne Schleunitz; Gabi Gruetzner

Published date:2023-5-1

DOI:10.1117/12.2661526

Article link:https://doi.org/10.1117/12.2661526

Article Source:SPIE


Remark:
Reply

Use magic Donate Report

All Reply1 Show all posts
tareq932365 Post time Yesterday 18:59 | Show all posts

Waiting for confirmation

If the PDF has not been accepted after 72 hours, the system will automatically adopt it.
Reply

Use magic Donate Report

Senior Member
  • post

  • reply

  • points

    3660


Return to the list