[IOP] Optimization and integration of ultrathin e-beam grown HfO2gate dielectrics in MoS2transistors

Harishnanda Post time Half hour(s) ago | Show all posts |Read mode

This post will be closed automatically in 2026-09-18 13:48

Reward10points

journal：Journal of Physics D: Applied Physics

Authors：Kolla Lakshmi Ganapathi; Navakanta Bhat; Sangeneni Mohan

Published date：2021-11-4

DOI：10.1088/1361-6463/ac19e0

PDF link：https://iopscience.iop.org/article/10.1088/1361-6463/ac19e0

Article link：https://doi.org/10.1088/1361-6463/ac19e0

Article Source：IOP Publishing。

Remark：

Reply

All Reply0 Show all posts

Harishnanda Lv.2

Junior Member

[IOP] Optimization and integration of ultrathin e-beam grown HfO2gate dielectrics in MoS2transistors Copy