[SPIE] Active area patterning for CFET: nanosheet etch

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journal:Advanced Etch Technology and Process Integration for Nanopatterning XIII

Authors:Vincent Brissonneau; Il Gyo Koo; Maryam Hosseini; Dmitry Batuk; Anabela Veloso; Geert Mannaert; Frédéric Lazzarino

Published date:2024-4-9

DOI:10.1117/12.3012322

Article link:https://doi.org/10.1117/12.3012322

Article Source:SPIE


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