[Other] Enhanced resistance switching ratio of Hf0.5Zr0.5O2-based film through reducing oxygen vacancy concentration

padmau Post time 1 hour(s) ago | Show all posts |Read mode
This post will be closed automatically in 2026-09-24 14:40
Reward20points

journal:Applied Physics Letters

Authors:Hong Wei Wang; Jin Peng Cao; Wei Ye Deng; Jun Kun Wu; Li Hong Yang; Zhang Jian Zhou; Chun Feng; Yang Bai; Qi Liang Li; Jun Miao

Published date:2025-9-30

DOI:10.1063/5.0285927

PDF link:https://pubs.aip.org/aip/apl/art ... 901_1_5.0285927.pdf

Article link:https://doi.org/10.1063/5.0285927

Article Source:AIP Publishing


Remark:
Reply

Use magic Donate Report

All Reply0 Show all posts

Reply

You have to log in before you can reply Login | Register

Points Rules

Intermediate member
  • post

  • reply

  • points

    410

Return to the list