[Other] Improving SiO2 to SiNx etch selectivity during atomic layer etching with multiple selective organic pre-functionalization steps

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journalㄩJournal of Vacuum Science & Technology A

AuthorsㄩXue Wang; Ryan J. Gasvoda; Eric A. Hudson; Prabhat Kumar; Sumit Agarwal

Published dateㄩ2024-5-1

DOIㄩ10.1116/6.0003447

PDF linkㄩhttps://pubs.aip.org/avs/jva/art ... 602_1_6.0003447.pdf

Article linkㄩhttps://doi.org/10.1116/6.0003447

Article SourceㄩAmerican Vacuum Society﹝


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