[Other] Investigation of Bowing Reduction in SiO2 Etching Taking into Account Radical Sticking in a Hole

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journalㄩJapanese Journal of Applied Physics

AuthorsㄩMasaru Izawa; Nobuyuki Negishi; Ken'etsu Yokogawa; Yoshinori Momonoi

Published dateㄩ2007-12-1

DOIㄩ10.1143/jjap.46.7870

PDF linkㄩhttps://iopscience.iop.org/article/10.1143/JJAP.46.7870

Article linkㄩhttps://doi.org/10.1143/jjap.46.7870

Article SourceㄩIOP Publishing﹝


RemarkㄩInvestigation of Bowing Reduction in SiO2 Etching Taking into Account Radical Sticking in a Hole

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