[Elsevier] Study on silicon removal property and surface smoothing phenomenon by moderate-pressure microwave hydrogen plasma

Thiruparthi Post time Yesterday 14:46 | Show all posts |Read mode
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journalㄩMaterials Science in Semiconductor Processing

AuthorsㄩHiromasa Ohmi; Kenta Kimoto; Toshimitsu Nomura; Hiroaki Kakiuchi; Kiyoshi Yasutake

Published dateㄩ2021-7-

DOIㄩ10.1016/j.mssp.2021.105780

PDF linkㄩhttps://www.sciencedirect.com/sc ... 369800121001207/pdf

Article linkㄩhttps://doi.org/10.1016/j.mssp.2021.105780

Article SourceㄩElsevier BV﹝


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