[Elsevier] Trivalent lanthanum and ytterbium doped meso-silica/ceria abrasive systems toward chemical mechanical polishing (CMP) and ultraviolet irradiation-assisted photochemical mechanical polishing (PCMP)

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期刊:应用表面科学

作者:寇子涵;王超;周文进;陈爱莲;陈阳

发表日期:2024年6月

DOI:10.1016/j.apsusc.2024.159733

PDF链接:https://www.sciencedirect.com/sc ... 16943322400446X/pdf

文章链接:https://doi.org/10.1016/j.apsusc.2024.159733

文章来源:Elsevier BV。


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