[ACS] Electroforming Kinetics in HfOx/Ti RRAM: Mechanisms behind Compositional and Thermal Engineering

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Edited by shakib22 at 2026-10-29 11:55

journal：ACS Nano

Authors：Manasa Kaniselvan; Kevin Portner; Donato Francesco Falcone; Valeria Bragaglia; Jente Clarysse; Laura Bégon-Lours; Marko Mladenovi; Bert J. Offrein; Mathieu Luisier

Published date：2025-8-5

DOI：10.1021/acsnano.5c05850

PDF link：https://pubs.acs.org/doi/pdf/10.1021/acsnano.5c05850

Article link：https://doi.org/10.1021/acsnano.5c05850

Article Source：American Chemical Society (ACS)。

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