[Elsevier] Simulation-guided AI-driven digital twin for plasma etching in semiconductor fabrication

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journalㄩDevice

AuthorsㄩSanghoon Myung; Kyeyeop Kim; Chanyoung Lee; Jinwoo Kim; Yunji Choi; Gijae Kang; Namhyun Kim; Beomwon Jung; Jaejun Lee; Jiseong Doh; Kyu Baik Chang; Jaehyun Bae; Sun-Taek Lim; Seungmin Lee; Kwang-Yong Yang; Dohaing Lee; KeunHee Bai; Dae Sin Kim; Jaehoon Jeong

Published dateㄩ2026-3-

DOIㄩ10.1016/j.device.2025.101026

PDF linkㄩhttps://www.sciencedirect.com/sc ... 666998625003394/pdf

Article linkㄩhttps://doi.org/10.1016/j.device.2025.101026

Article SourceㄩElsevier BV﹝


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