[Elsevier] Atomic layer deposition (ALD): from precursors to thin film structures

LeoRosas Post time 3 day(s) ago | Show all posts |Read mode
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Markku Leskelä, Mikko Ritala,
Atomic layer deposition (ALD): from precursors to thin film structures,
Thin Solid Films,
Volume 409, Issue 1,
2002,
Pages 138-146,
ISSN 0040-6090,
https://doi.org/10.1016/S0040-6090(02)00117-7.

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