[RSC] Effects of oxidizer concentration and abrasive type on interfacial bonding and material removal in 4H-SiC polishing processes |
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Determination and investigation of defect domains in multi-shape monolayer tungsten disulfide
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Tuning of structural and optical properties with enhanced catalytic activity in chemically synthesized Co-doped MoS2nanosheets
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Effects of oxidizer concentration and abrasive type on interfacial bonding and material removal in 4H-SiC polishing processes
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Atomic-level surface formation of large-size SiC substrates by chemical mechanical polishing: interfacial chemistry and removal mechanism
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Correction: Synthesis, crystal structure and DFT studies of a methylphenyl piperazinyl dithiocarbamato zinc(ii) precursor for zinc sulfide nanophotocatalysts used for the degradation of trypan blue and rhodamine 6G dyes
