[Other] Interfacial Reaction Engineering for Use in Hf0.5Zr0.5O2-Based Metal-Ferroelectric-Metal Capacitors Using N2 + H2 Gas Pretreatment

mhaseakash Post time 7 day(s) ago | Show all posts |Read mode
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journal:ACS Applied Electronic Materials

Authors:Seung Yeon Kim; Dong Hee Han; Jaehyeon Yun; Woojin Jeon

Published date:2025-4-8

DOI:10.1021/acsaelm.5c00045

PDF link:https://pubs.acs.org/doi/pdf/10.1021/acsaelm.5c00045

Article link:https://doi.org/10.1021/acsaelm.5c00045

Article Source:American Chemical Society (ACS)


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