[SPIE] Development of topcoat-less PFAS-free ArF Immersion resist with novel additive and PAG design

Sweetums33 Post time 6 day(s) ago | Show all posts |Read mode
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journal:Advances in Patterning Materials and Processes XLIII

Authors:Seina Saito; Yu Hayakawa; Takehito Seo

Published date:2026-4-9

DOI:10.1117/12.3089726

Article link:https://doi.org/10.1117/12.3089726

Article Source:SPIE


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